UMSI 2000 Annual Report: P. Paul Ruden, Associate Fellow Previous Page  |  Table of Contents  |  Next Page

P. Paul Ruden, Associate Fellow


Properties of Semiconductor Materials and Devices

The electronic structure and related properties of semiconductor materials and novel devices are being calculated. Previously, this work focused on calculations of the electronic structures of quantum wires and on transport simulations for large band-gap III-nitride materials using Monte Carlo technique. Current emphasis is on the modeling of strain effects in III-V heterostructure devices in the framework of the finite element method. Additional work is focusing on further Monte Carlo transport simulations for large band gap materials and on the creation of device models for large gap semiconductor devices. The last topic requires significantly higher levels of precision than conventional semiconductor device modeling, primarily due to the much wider range of values assumed by variables such as the electron and hole concentrations.

Research Group

John D. Albrecht, Graduate Student Researcher Tan Li, Graduate Student Researcher Goran Prstic, Graduate Student Researcher Agustinus Sutandi, Graduate Student Researcher Yumin Zhang, Graduate Student Researcher


1999 UMSI Publications
99/113
"High Field Electron Transport Properties of Bulk ZnO," J.D. Albrecht, P.P. Ruden, S. Limpijumnong, W.R.L. Lambrecht, and K.F. Brennan, Journal of Applied Physics, 86, p. 6864 (1999).
A complete Bibliography can be found on the Internet at:
www.msi.umn.edu/cgi-bin/reports/searchv2.html

Another project, dealing with three-dimensional mesh generation for GaN device modeling, is currently underway. These researchers have developed a three-dimensional finite element code for thermal modeling of GaN heterojunction field effect transistors (HFET). They are using the finite element mesh generation package gambit on the IBM SP as the pre-processor for the code. The technical difficulty that justifies the use of gambit is that the model demands the ratio of the smallest feature size within the domain and linear dimension of the boundary to be ten thousand. Hence, good graphic visualization and heavy computation is required to generate the correct mesh. The success of modeling will have positive impact on the prediction of the power performance of GaN HFET.


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