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Research Abstracts Online
January 2008 - March 2009

University of Minnesota Twin Cities
Institute of Technology
Department of Chemistry

PI: Wayne L. Gladfelter, Associate Fellow

Combinatorial Chemical Vapor Deposition and Atomic Layer Deposition of Thin Metal Oxide Films

These researchers use computational fluid dynamics to understand the experiment process that they developed, known as combinatorial chemical vapor deposition (CVD). The research involves the use of CFD-ACE, which is available at the Supercomputing Institute. The goal is to make the entire CVD process more predictable by quantifying the relationship between the precursor flux to the substrate surface and the deposition kinetics.

Group Members

Margaret Broz, Graduate Student
Tyler Moersch, Graduate Student
Julia Rossini, Graduate Student