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Pui_DYH

Research Abstracts Online
January 2009 - March 2010

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University of Minnesota Twin Cities
Institute of Technology
Department of Mechanical Engineering

PI: David Y.H. Pui, Associate Fellow

Numerical Investigation of Nanoparticle Contamination, Deposition, and Separation in Semiconductor Manufacturing, Air Filtration, and Human Health

These researchers are currently involved in several projects involving particles and filtration. One involves extreme ultraviolet lithography (EUVL), a strong candidate for the next generation lithography for manufacturing integrated circuits of feature size down to 30 nm and beyond. One of the most crucial challenges for EUVL technology is the prevention of particle contamination on EUVL masks. Since conventional pellicles cannot be used to protect the EUVL mask, it is therefore necessary to develop new protection schemes to prevent the contamination of EUVL masks in all stages of handling, storage, and shipping. The researchers are performing numerical simulations to investigate deposition of very small particles on EUVL masks as part of this research.

A second project uses numerical simulation to investigate filtration of aerosol particles by fibrous filters. They have developed a numerical model composed of a layer of nanofibers and a porous medium that simulates a substrate. Results from this model are in good agreement with experimental data.

The third project investigates the cone-jet mode in a dual-capillary electrospraying system. This mode is especially valuable for practical applications because of its ability to produce highly charged, monodispersed capsules. The researchers are developing a model that will help them study the establishment and operation envelope of the cone-jet mode operation, which is useful in understanding the mechanisms involved.

Group Members

Christof Asbach, Institut für Energie- und Umwelttechnik (IUTA), Duisburg, Germany
Da-Ren Chen, Department of Energy, Environmental, and Chemical Engineering, Washington University in St. Louis, St. Louis, Missouri
Seong Chan Kim, Research Associate
Tsz Yan Ling, Graduate Student
Chaolong Qi, Research Associate
Weon Shin, Graduate Student
Jimmy Jing Wang, Research Associate